tag:blogger.com,1999:blog-2986579286488690981.post698675617006058825..comments2024-03-28T09:53:01.389-04:00Comments on TCI Powder Coatings Blog: The Problem-Solution Series: Part 21TCI Powder Coatingshttp://www.blogger.com/profile/15937070748138836195noreply@blogger.comBlogger1125tag:blogger.com,1999:blog-2986579286488690981.post-82224005790927050482016-11-27T10:51:03.114-05:002016-11-27T10:51:03.114-05:00Subject the material order sputtering preparation ...<br /><br />Subject the material order sputtering preparation of multilayer films, sputtered oxides and other insulating materials and alloys almost no decomposition and fractionation.<br />For example, the use of silicon, oxygen and argon with the pass into the vacuum chamber as the sputtering target can be obtained after sputtering a Si02 insulating film; the use of titanium as a sputtering target, nitrogen and argon with Walter vacuum chamber, after splash.<br />We can see more: <a href="http://www.nandk.com" rel="nofollow">film thickness</a>Anonymousnoreply@blogger.com